COMPOSITION OF TI-N FILMS - EDX ANALYSIS DURING THE SPUTTERING PROCESS

Energy dispersive X-ray (EDX) analysis was applied in-situ for measure ments of composition, surface mass and deposition rate of Ti atoms dur ing reactive sputtering. Electron beam excitation was used for the det ermination of composition and X-ray fluorescence (XRF) for the surface mass determination. Intensity measurements of the optical emission of Ti atoms agree well with the deposition rate of Ti atoms measured by XRF. The influences of nitrogen mass flow and negative bias substrate voltage on concentration and sputtering rate were investigated in homo geneous TiN(x) films and TiN(x)/TiN(y) multilayers.