COMBINED AES FACTOR ANALYSIS AND RBS INVESTIGATION OF A THERMALLY TREATED PT/TI METALLIZATION ON SIO2/

Pt/Ti metallisation bilayers are used as bottom electrodes for ferroel ectric thin films. During deposition of the ferroelectric films, these electrodes are exposed to elevated temperatures causing modifications of the Pt/Ti bottom electrode. Diffusion and oxidation of the Ti adhe sion layer have been studied by the application of factor analysis to AES depth profile data and by RBS. Factor analysis was employed to ext ract the chemical information from the measured AES spectra and to der ive semiquantitative depth profiles of the identified material compoun ds. RBS was used to obtain the quantitative depth distribution of the elements. By the combination of both methods, diffusion and oxidation processes were observed and could be precisely described.