W. Fischer et al., ON THE INFLUENCE OF NITROGEN AND OXYGEN ON THE GD-OES ANALYSIS RESULTS, Fresenius' journal of analytical chemistry, 346(1-3), 1993, pp. 346-350
The effect of nitrogen and oxygen impurities in argon on the analytica
l line intensity of various elements and other discharge parameters of
a dc glow discharge has been studied. The two gaseous impurities were
introduced into the discharge gas argon as molecular gaseous addition
s as well as sputtering products from the samples. Both elements may i
nitiate chemical reactions in the plasma leading to a reduction of the
number of free atoms of the determined elements available for excitat
ion in the discharge plasma. Considering the main components of the in
vestigated sample, nitrogen or oxygen contents exceeding the critical
threshold of about 0.1 mass-% may alter the analytical line intensitie
s of the elements of interest significantly. The effect of smaller gas
eous impurity contents could be detected only by the determination of
the emission yield. The line intensity may increase or decrease depend
ing on the elements present in the discharge plasma.