SURFACE-DIFFUSION DURING THIN-FILM ANNEALING STUDIED BY XPS

Authors
BOT A VANSLOOTEN U KOPPERS WR KLEYN AW
Citation
A. Bot et al., SURFACE-DIFFUSION DURING THIN-FILM ANNEALING STUDIED BY XPS, Surface science, 287, 1993, pp. 901-906
Citations number
7
Categorie Soggetti
Chemistry Physical
Journal title
Surface science → ACNP
ISSN journal
00396028
Volume
287
Year of publication
1993
Part
B
Pages
901 - 906
Database
ISI
SICI code
0039-6028(1993)287:<901:SDTASB>2.0.ZU;2-J
Abstract
We describe a simple solid-on-solid model that includes diffusion to p redict the peak intensity of X-ray photoelectron spectroscopy (XPS) an d Auger electron spectroscopy (AES) lines from thin films adsorbed at a surface. We compare the results with XPS experiments on Ba/Ag(111), and conclude that for multilayer coverage, annealing above 600 K leads to a structure of the overlayer that is determined by entropy.