SCANNING PHOTOEMISSION MICROSCOPY ON MAXIMUM REACHES 0.1 MICRON RESOLUTION

We present the first results from the upgraded version of the scanning photoemission spectromicroscope MAXIMUM, bared on synchrotron undulat or fight and on a multilayer-coated Schwarzschild objective. The upgra de involved nearly all parts of the instrument, notably the beamline a nd the electron analysis system. Micro-images of Fresnel zone plates a nd of metal test patterns on semiconductor substrates reached a new re cord in lateral resolution, well beyond 0.1 micron. The first spectrom icroscopy tests were also successfully performed on the new instrument , with analysis of f and d core levels in different systems.