M. Beier et al., INVESTIGATIONS OF NONLINEAR PROCESSES BY TRANSIENTS - KINETICS OF DISSOLUTION OF INHIBITOR LAYERS ON COPPER, Journal of Applied Electrochemistry, 23(6), 1993, pp. 606-614
The dissolution of inhibitor layers of AHT (3-amino-5-heptyl-1,2,4-tri
azole) on copper wires in 0.5 M H2SO4 was studied by potentiostatic cu
rrent and capacity transients in a time range from 10 mus to 1000 s. T
he potential dependent transients show three characteristic regions co
rresponding to different transfer controlled processes. For short peri
ods an almost constant current of inhibited corrosion through a metast
able inhibitor layer is observed. In the second region the dissolution
of this layer causes a strong increase in copper corrosion, which was
taken as a direct measure of the desorption process. The electrode ca
pacity, C, increases correspondingly. The dissolution itself is not ac
companied by a notable charge transfer and, hence, cannot directly be
monitored. The last region is dominated by an almost constant active c
opper dissolution current. The layer dissolution in the second region
starts with an inhomogeneous nucleation process. Initially, holes are
generated stochastically in the AHT layer and form nuclei of corrosion
pits on the copper surface. Based on this model the complete transien
ts can be calculated.