OPTICAL-EMISSION SPECTRA FROM MICROWAVE OXYGEN PLASMA PRODUCED BY SURFATRON DISCHARGE

This paper is devoted to a systematic study of the production of molec ular and atomic ions and excited atoms in a microwave oxygen plasma, g enerated by surfatron in a quartz tube (i.d. 6 mm). The content of O2, O+ and O is measured, using the optical emission spectroscopy, in a wide range of oxygen pressures (from 3.5 Pa to 10(2) Pa) and microwave s powers (from about 30 W to 300 W) delivered into the plasma. It is s hown that the content of individual species O2+, O+ and O strongly dep ends on the conditions, particularly operating pressure p and the micr owave power P, under which plasma is created. It means that the chemic al reactivity of microwave plasma also strongly depends on p and P. It is of great importance for many practical applications, e.g. for a re producible production of thin films with prescribed properties.