Sy. Hou et al., PRECIPITATES IN YBA2CU3O7-DELTA THIN-FILMS ANNEALED AT LOW-OXYGEN PARTIAL-PRESSURE, Applied physics letters, 62(24), 1993, pp. 3201-3203
We have studied the precipitates in YBa2Cu3O7-delta(YBCO) thin films g
rown by the BaF2 process in p(O2)= 4 Torr and 700-degrees-C. While sto
ichiometric films result in BaCuO2 surface precipitates, we have found
Y2Cu2O5 precipitates embedded in the matrix of the same film. Off sto
ichiometric films with Ba/Y < 1.5 have a precipitate-free surface but
with higher abundance of Y2Cu2O5 in the film matrix. The estimated den
sities of the two precipitates favor a stoichiometric YBCO film matrix
. This behavior is not explainable in terms of phase equilibria and is
attributed to kinetic effects. The electrical properties of the films
degrade as the Ba/Y ratio deviates from 2.00.