Nn. Ekzhanov et al., MASS-SPECTROSCOPIC STUDIES OF SURFACE CONTAMINATION OF OPTICAL-GLASS AFTER ION-BEAM TREATMENT, Soviet journal of optical technology, 60(2), 1993, pp. 105-107
It is shown that the surface contamination level can be substantially
reduced by choosing materials with a low sputtering coefficient and op
timizing the operating regimes of the ion source. Results are presente
d that characterize the contamination of dielectric films obtained by
reactive electron-beam deposition with ion assist.