MASS-SPECTROSCOPIC STUDIES OF SURFACE CONTAMINATION OF OPTICAL-GLASS AFTER ION-BEAM TREATMENT

Citation
Nn. Ekzhanov et al., MASS-SPECTROSCOPIC STUDIES OF SURFACE CONTAMINATION OF OPTICAL-GLASS AFTER ION-BEAM TREATMENT, Soviet journal of optical technology, 60(2), 1993, pp. 105-107
Citations number
NO
Categorie Soggetti
Optics
ISSN journal
00385514
Volume
60
Issue
2
Year of publication
1993
Pages
105 - 107
Database
ISI
SICI code
0038-5514(1993)60:2<105:MSOSCO>2.0.ZU;2-B
Abstract
It is shown that the surface contamination level can be substantially reduced by choosing materials with a low sputtering coefficient and op timizing the operating regimes of the ion source. Results are presente d that characterize the contamination of dielectric films obtained by reactive electron-beam deposition with ion assist.