APPLICATION OF ION-BEAM-SPUTTERED AL FILMS TO ULTRATHIN SURFACE-ACOUSTIC-WAVE DEVICES

Ion-beam sputtering technique has been applied to Al film deposition f or electrodes in high-frequency surface acoustic wave devices. Al film s having low resistivity and a smooth surface have been obtained, even in the ultrathin thickness range. It was shown that the ion-beam sput tering technique provided excellent thickness uniformity and controlla bility. This method was also applied to the deposition of highly prefe rred [111]-textured Al films.