PROPERTIES OF RF-SPUTTERED NIOBIUM THIN-FILMS FOR METROLOGICAL APPLICATIONS

Citation
D. Andreone et al., PROPERTIES OF RF-SPUTTERED NIOBIUM THIN-FILMS FOR METROLOGICAL APPLICATIONS, Applied superconductivity, 1(7-9), 1993, pp. 1333-1340
Citations number
14
Categorie Soggetti
Material Science","Physics, Applied","Physics, Condensed Matter
Journal title
ISSN journal
09641807
Volume
1
Issue
7-9
Year of publication
1993
Pages
1333 - 1340
Database
ISI
SICI code
0964-1807(1993)1:7-9<1333:PORNTF>2.0.ZU;2-O
Abstract
Niobium superconductive films for metrological applications (refractor y Josephson tunnel junctions, superconductive bolometers and radiation sensors), have been fabricated via r.f. magnetron sputtering. Their e lectrical and structural properties have been measured on a wide range of film thicknesses (10-1000 nm). The data indicate the growth of a f irst layer at the substrate interface, which has a different behaviour with respect to the remaining of the film. The electrical data of res istivity at various temperatures show the relevant role of this layer at thicknesses < 200 nm and the effect of pre-deposition treatments on the reduction of this interfacial layer. Experimental resistivity dat a can be fitted for these thicknesses only using a modified version of the Mayadas-Shatzkes model, which keeps into account not only the ref lection at grain boundaries but also the altered composition layer.