EVALUATION OF INTERFACIAL NITROGEN CONCENTRATION OF RTP OXYNITRIDES BY REOXIDATION

Authors
OKADA Y TOBIN PJ LAKHOTIA V AJURIA SA HEGDE RI LIAO JC RUSHBROOK PP ARIAS LJ
Citation
Y. Okada et al., EVALUATION OF INTERFACIAL NITROGEN CONCENTRATION OF RTP OXYNITRIDES BY REOXIDATION, Journal of the Electrochemical Society, 140(6), 1993, pp. 87-89
Citations number
10
Categorie Soggetti
Electrochemistry
Journal title
Journal of the Electrochemical Society → ACNP
ISSN journal
00134651
Volume
140
Issue
6
Year of publication
1993
Pages
87 - 89
Database
ISI
SICI code
0013-4651(1993)140:6<87:EOINCO>2.0.ZU;2-S
Abstract
We prepared oxynitrides with different interfacial nitrogen concentrat ion ([N(int)]) using RTP. Reoxidation kinetics of these oxynitrides wa s studied. It was found that reoxidation thickness strongly depends on the [N(int)]. The reoxidation kinetics can be used for the evaluation of [N(int)].