FUNDAMENTAL RESEARCH ON THE DEPOSITION OF CUBIC BORON-NITRIDE FILMS ON CURVED SUBSTRATES BY ION-BEAM-ASSISTED VAPOR-DEPOSITION

As fundamental research to deposit cubic boron nitride (BN) films on c urved substrates by the ion-beam-assisted vapor deposition method usin g boron deposition and the irradiation of nitrogen and argon ions, BN films were deposited on Si substrates by waving them and continuously changing the angle of ion irradiation. As a result, it has become clea r that cubic BN films are deposited even when the waving angle is +/-9 0-degrees, and that the cubic BN films are deposited on curved substra te surfaces when the substrates are rotated or waved.