STRUCTURAL-ANALYSIS OF ZR-N AND TI-N FILMS PREPARED BY REACTIVE PLASMA BEAM DEPOSITION

Authors
PANJAN P NAVINSEK B ZABKAR A MARINKOVIC V MANDRINO D FISER J
Citation
P. Panjan et al., STRUCTURAL-ANALYSIS OF ZR-N AND TI-N FILMS PREPARED BY REACTIVE PLASMA BEAM DEPOSITION, Thin solid films, 228(1-2), 1993, pp. 233-237
Citations number
13
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
Thin solid films → ACNP
ISSN journal
00406090
Volume
228
Issue
1-2
Year of publication
1993
Pages
233 - 237
Database
ISI
SICI code
0040-6090(1993)228:1-2<233:SOZATF>2.0.ZU;2-P
Abstract
The effect of composition of Zr-N and Ti-N films and deposition temper ature on lattice expansion was investigated. Zr-N and Ti-N films conta ining various at.% of nitrogen were prepared by reactive sputter depos ition in a Balzers Sputron plasma beam apparatus. Both Zr-N and Ti-N f ilms were grown at a substrate temperature of 180-degrees-C and some o f the ZrN films also at substrate temperatures between 400 and 700-deg rees-C. Interplanar distances and textures were determined using Seema nn-Bohlin and Bragg-Brentano X-ray diffraction.