LOW-TEMPERATURE PLASMA TREATMENT OF MONOMOLECULAR LANGMUIR-BLODGETT-FILMS

Citation
Aa. Kalachev et al., LOW-TEMPERATURE PLASMA TREATMENT OF MONOMOLECULAR LANGMUIR-BLODGETT-FILMS, Thin solid films, 228(1-2), 1993, pp. 307-311
Citations number
17
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
228
Issue
1-2
Year of publication
1993
Pages
307 - 311
Database
ISI
SICI code
0040-6090(1993)228:1-2<307:LPTOML>2.0.ZU;2-N
Abstract
The structure of the surface layer of materials is usually quite diffe rent from the bulk. Detailed information about the surface structure i s often not available. This, together with the complex nature of low t emperature plasma treatment, hinders the investigations of plasma chem ical processes on solid surfaces. Monomolecular Langmuir-Blodgett (LB) structures offer a unique opportunity to prepare model surfaces with known thickness and molecular architecture. From the data obtained, th e depth of the Ar plasma influence on solid organic surfaces was estim ated to be about 400-1000 angstrom depending on the nature of the surf ace layer. An oxygen plasma penetrates deeper with a penetration limit greater than 1000 angstrom. Using plasma treatment, one can improve o r regulate the properties of the LB structure, e.g. one can introduce new functionalities and improve thermostability. It is shown that by p lasma treatment it is possible to prepare thin organoceramic films fro m metal- or silicon-containing LB films.