DAMAGE PROFILES IN AS-IMPLANTED (100) SI CRYSTALS - STRAIN BY X-RAY-DIFFRACTOMETRY VERSUS INTERSTITIALS BY RBS-CHANNELING (VOL 120, PG 64, 1996)

Authors
NIPOTI R BIANCONI MSM MILITA S
Citation
R. Nipoti et al., DAMAGE PROFILES IN AS-IMPLANTED (100) SI CRYSTALS - STRAIN BY X-RAY-DIFFRACTOMETRY VERSUS INTERSTITIALS BY RBS-CHANNELING (VOL 120, PG 64, 1996), Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 122(4), 1997, pp. 699-699
Citations number
1
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
Journal title
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms → ACNP
ISSN journal
0168583X
Volume
122
Issue
4
Year of publication
1997
Pages
699 - 699
Database
ISI
SICI code
0168-583X(1997)122:4<699:DPIA(S>2.0.ZU;2-X