MECHANISMS OF PARTICLE DEPOSITION FROM ULTRAPURE CHEMICALS ONTO SEMICONDUCTOR WAFERS - DEPOSITION FROM BULK LIQUID DURING WAFER SUBMERSION

Authors
RILEY DJ CARBONELL RG
Citation
Dj. Riley et Rg. Carbonell, MECHANISMS OF PARTICLE DEPOSITION FROM ULTRAPURE CHEMICALS ONTO SEMICONDUCTOR WAFERS - DEPOSITION FROM BULK LIQUID DURING WAFER SUBMERSION, Journal of colloid and interface science, 158(2), 1993, pp. 259-273
Citations number
42
Categorie Soggetti
Chemistry Physical
Journal title
Journal of colloid and interface science → ACNP
ISSN journal
00219797
Volume
158
Issue
2
Year of publication
1993
Pages
259 - 273
Database
ISI
SICI code
0021-9797(1993)158:2<259:MOPDFU>2.0.ZU;2-D