THERMODYNAMIC SIMULATION OF MOLYBDENUM DEPOSITION AND TUNGSTEN DISILICIDES IN MO CVD PROCESSES

Authors
KUZNETSOV FA TITOV VA GOLUBENKO AN TITOV AA
Citation
Fa. Kuznetsov et al., THERMODYNAMIC SIMULATION OF MOLYBDENUM DEPOSITION AND TUNGSTEN DISILICIDES IN MO CVD PROCESSES, Sibirskij himiceskij zurnal, (2), 1993, pp. 112-118
Citations number
12
Categorie Soggetti
Chemistry
Journal title
Sibirskij himiceskij zurnal → ACNP
ISSN journal
08692793
Issue
2
Year of publication
1993
Pages
112 - 118
Database
ISI
SICI code
0869-2793(1993):2<112:TSOMDA>2.0.ZU;2-J
Abstract
Modeling of disilicides deposition in the systems with wolatile metal organic and fluorinated silicon organic compounds was performed for a number of system: M-Si-C-H-Ar, M-Si-C-O-Cl-H-Ar, M-Si-C-H-F-Ar, M-Si-C -O-F-H-Ar (M = W, Mo). It was shown that in some of these systems (esp ecially with fluorinated compounds) there were wider regions of quasi- equilibrium deposition of disilicides.