NANOCRYSTALLINE GE IN SIO2 BY ANNEALING OF GEXSI1-XO2 IN HYDROGEN

Citation
Ws. Liu et al., NANOCRYSTALLINE GE IN SIO2 BY ANNEALING OF GEXSI1-XO2 IN HYDROGEN, Applied physics letters, 62(25), 1993, pp. 3321-3323
Citations number
7
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
62
Issue
25
Year of publication
1993
Pages
3321 - 3323
Database
ISI
SICI code
0003-6951(1993)62:25<3321:NGISBA>2.0.ZU;2-S
Abstract
We have synthesized nanocrystalline Ge in vitreous SiO2 by annealing a morphous Ge0.38Si0.62O2 in hydrogen at 700-degrees-C. The germanium di oxide in Ge0.38Si0.62O2 is thermodynamically unstable in the presence of hydrogen and thus precipitates out as elemental Ge. Elemental Si is not needed in this reduction process. Cross-sectional transmission el ectron microscopy reveals that the nucleation process is homogeneous, leading to a uniform distribution of small Ge crystallites imbedded in the remaining vitreous SiO2.