OPTIMAL EPILAYER THICKNESS FOR INXGA1-XAS AND INYAL1-YAS COMPOSITION MEASUREMENT BY HIGH-RESOLUTION X-RAY-DIFFRACTION

Citation
Br. Bennett et Ja. Delalamo, OPTIMAL EPILAYER THICKNESS FOR INXGA1-XAS AND INYAL1-YAS COMPOSITION MEASUREMENT BY HIGH-RESOLUTION X-RAY-DIFFRACTION, Journal of applied physics, 73(12), 1993, pp. 8304-8308
Citations number
22
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
73
Issue
12
Year of publication
1993
Pages
8304 - 8308
Database
ISI
SICI code
0021-8979(1993)73:12<8304:OETFIA>2.0.ZU;2-W
Abstract
The composition of InxGa1-xAs and InyAl1-yAs epitaxial layers on InP s ubstrates can be measured by high-resolution x-ray diffraction (HRXRD) in many cases. If layers are too thick, however, substantial lattice relaxation will occur, requiring multiple asymmetric scans to determin e composition. If layers are too thin, they will not produce a distinc t Bragg peak. Based upon measurements of both coherent and relaxed lay ers as well as simulations, we have determined the range of epilayer t hickness over which a single HRXRD scan yields the composition of InxG a1-xAs and InyAl1-yAs layers to within 1%. Calibration layers grown wi thin this range allow fast and accurate characterization.