THE DISSOLUTION RATE OF PHOTORESIST WITH REPEATED DEVELOPER USE

Authors
SALMINEN O AHONEN V
Citation
O. Salminen et V. Ahonen, THE DISSOLUTION RATE OF PHOTORESIST WITH REPEATED DEVELOPER USE, Journal of imaging science and technology, 37(2), 1993, pp. 211-212
Citations number
3
Categorie Soggetti
Photographic Tecnology
Journal title
Journal of imaging science and technology → ACNP
ISSN journal
10623701
Volume
37
Issue
2
Year of publication
1993
Pages
211 - 212
Database
ISI
SICI code
1062-3701(1993)37:2<211:TDROPW>2.0.ZU;2-Z
Abstract
The dissolution rate of a novolak-type photoresist, Hoechst AZ 1450J, was studied. Photoresist plates were soaked one after the other in the same solution of developer. The time needed to remove a layer of a ce rtain thickness was measured. Measurements showed that the time requir ed was strongly dependent on both the exposure and the number of plate s already developed.