ION-BEAM SPUTTERING DEPOSITION OF FLUOROPOLYMER THIN-FILMS

Authors
QUARANTA F VALENTINI A FAVIA P LAMENDOLA R DAGOSTINO R
Citation
F. Quaranta et al., ION-BEAM SPUTTERING DEPOSITION OF FLUOROPOLYMER THIN-FILMS, Applied physics letters, 63(1), 1993, pp. 10-11
Citations number
7
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
63
Issue
1
Year of publication
1993
Pages
10 - 11
Database
ISI
SICI code
0003-6951(1993)63:1<10:ISDOFT>2.0.ZU;2-0
Abstract
It is shown that it is possible to deposit thin films with various CF( x) composition (1.26 less-than-or-equal-to x less-than-or-equal-to 1.8 3) by ion-beam sputtering. These materials with ''teflon-like'' compos ition have been deposited at room temperature by Ar ion-beam sputterin g of a teflon target; the film chemical composition has been determine d by electron spectroscopy for chemical analysis. The fluorine-to-carb on ratio of the films, as well as their crosslinking degree, is shown to depend on the energy of the ions impinging on the target.