Mam. Gijs et al., NEW CONTACTING TECHNIQUE FOR THIN-FILM RESISTANCE MEASUREMENTS PERPENDICULAR TO THE FILM PLANE, Applied physics letters, 63(1), 1993, pp. 111-113
Using microlithography, we have fabricated Au thin film structures for
resistance measurements with current directed perpendicular to the fi
lm plane. We propose a novel contact geometry for accurate measurement
of the very low metallic perpendicular resistance, which prevents any
disturbing influence from the much larger resistance of the contact l
eads. Our experimental results are well explained by a classical model
and our interpretation is independently confirmed by a three-dimensio
nal electrostatic calculation based on the finite element method.