CORRELATION BETWEEN SUBSTRATE PREPARATION TECHNIQUE AND SCATTER OBSERVED FROM OPTICAL COATINGS

Citation
Kc. Hickman et al., CORRELATION BETWEEN SUBSTRATE PREPARATION TECHNIQUE AND SCATTER OBSERVED FROM OPTICAL COATINGS, Applied optics, 32(19), 1993, pp. 3409-3415
Citations number
31
Categorie Soggetti
Optics
Journal title
ISSN journal
00036935
Volume
32
Issue
19
Year of publication
1993
Pages
3409 - 3415
Database
ISI
SICI code
0003-6935(1993)32:19<3409:CBSPTA>2.0.ZU;2-W
Abstract
We present experimental evidence of the dependence of coating scatter on a substrate preparation technique for fused silica substrates. Samp les included conventionally polished, superpolished, and float-polishe d substrates. We used scatterometry and total internal reflection micr oscopy to investigate the effects of substrate preparation on the perf ormance of zirconium oxide thin films. Results indicate that scatter f rom coatings dominates the scatter signature of the coated optic. They also demonstrate that substrate preparation can affect the level of s catter produced in optical coatings. In addition it is observed that t he substrates with the lowest scatter do not necessarily result in the coatings with the lowest scatter.