E. Wieser et al., ION-BEAM SYNTHESIS OF TERNARY (FE1-XCOX)SI2, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 80-1, 1993, pp. 867-871
Ternary(Fe,Co)Si2 is formed by two step implantation on (100) Si of 4
x 10(17) Fe/CM2 and 5 or 10 x 10(16) Co/cm2 with as well as without in
termediate annealing between the two implantations. The depth distribu
tion of Co and Fe and its change by post implantation annealing is stu
died by AES. The corresponding phase composition of the silicide layer
is investigated by X-ray diffraction. Implantation with intermediate
annealing enables the formation of (Fe80Co20)Si2 With the semiconducti
ng beta-FeSi2 structure. The existence of the band gap was detected by
IR absorption and reflection. The temperature of the phase transition
from the beta to the a structure decreases with increasing Co content
. This was proved by X-ray diffraction as well as by sheet resistivity
measurements.