T. Tsvetkova et al., SURFACE-MORPHOLOGY CHANGES IN ION-IMPLANTED CHALCOGENIDE FILMS AFTER ANNEALING, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 80-1, 1993, pp. 1264-1267
Here we report some results of ion implantation and annealing effects
on the surface morphology of thin amorphous films of materials in the
As-Se system. Ion implantation with different gaseous ions (Ar+, N+ an
d O+) and subsequent annealing have been performed leading to a change
in the thin film morphology and the measured optical properties. Opti
cal and electronic microscope photographs are presented showing detail
s of the rippled film surface. The influence of different types of sub
strates on the frost pattern formation is demonstrated and a possible
mechanism for the observed effects is discussed.