ON THE EFFICIENCY OF DEPOSITED ENERGY DENSITY FOR ION-BEAM MIXING PROCESSES WITH IONS IMPLANTED DURING AND AFTER THIN METAL-FILM DEPOSITION

Authors
TASHLYKOV IS BELYI IM BOBROVICH OG KALBITZER S MEYER O WOLF GK ENDERS B
Citation
Is. Tashlykov et al., ON THE EFFICIENCY OF DEPOSITED ENERGY DENSITY FOR ION-BEAM MIXING PROCESSES WITH IONS IMPLANTED DURING AND AFTER THIN METAL-FILM DEPOSITION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 80-1, 1993, pp. 98-101
Citations number
18
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
Journal title
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms → ACNP
ISSN journal
0168583X
Volume
80-1
Year of publication
1993
Part
1
Pages
98 - 101
Database
ISI
SICI code
0168-583X(1993)80-1:<98:OTEODE>2.0.ZU;2-H
Abstract
The influence of the energy density deposited in collision cascades (D ED) on the efficiency of the intermixing processes across bilayer inte rfaces was studied. The systems under investigation were bilayers of C u on Al (Cu/Al), Pd/Fe, Cr/Ti, Cu/Ti, W/Ti. The bilayer structures wer e irradiated with 6-30 keV Ar+, Kr+, Cr+, Cu+, W+ ions at doses up to 3 x 10(16) cm-2 . The value of DED varied from 0.2 to 13 eV/at. The mi xing profiles were obtained by using the RBS technique. The changes of relative concentrations of the intermixed components show that for so me systems the rate of interface mixing increases parallel with DED.