ION MONITORING OF ION-BEAM DYNAMIC MIXING PROCESS

Authors
CHAYAHARA A KIUCHI M MOKUNO Y HORINO Y FUJII K SATOU M
Citation
A. Chayahara et al., ION MONITORING OF ION-BEAM DYNAMIC MIXING PROCESS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 80-1, 1993, pp. 124-127
Citations number
16
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
Journal title
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms → ACNP
ISSN journal
0168583X
Volume
80-1
Year of publication
1993
Part
1
Pages
124 - 127
Database
ISI
SICI code
0168-583X(1993)80-1:<124:IMOIDM>2.0.ZU;2-A
Abstract
In the ion beam dynamic mixing process, the measurement of mass spectr a and energy distribution of ions are only tried during ion radiation and during syntheses of boron nitride films. The in situ secondary ion s measurement is possible, and a potential on the surface charged by i on irradiation can be directly estimated from a shift of the ion energ y distribution. It is found that secondary ionization yield of growth surface by boron evaporation changes according to irradiation current.