LATTICE LOCATION OF IMPLANTED FLUORINE IN DIAMOND

The implantation of fluorine in diamond has possible dopant and other applications, for which information is needed about the lattice sites occupied (if any). The relatively low mass and scattering cross-sectio n of fluorine present difficulties, however, in the use of Rutherford backscattering/channelling. Various annealing regimes were explored wi th a view to obtaining good counting statistics and yet minimising the damage induced in the substrate due to the fluorine implantation. The channelling data were fitted with models obtained by means of computa tion based on the flux equilibrium approach. We can conclude with reas onable confidence that fluorine may occupy a split-[100]-like intersti tial site rather than other sites anticipated by other workers.