THE PITTING CORROSION BEHAVIOR OF ALUMINUM ION-IMPLANTED WITH TITANIUM

The pitting corrosion behavior in deaerated 0.05M NaCl solution of tit anium ion implanted aluminum has been investigated. The samples were i mplanted with Ti ions using a Mevva high current metal ion implantatio n facility at doses ranging from 2 x 10(15) to 2 x 10(17) ions/cm2 and with ion energy from 30 to 120 keV, and the resultant Ti depth profil es were measured with Rutherford backscattering spectrometry (RBS). Th e pit density was decreased by up to two orders of magnitude relative to the unimplanted samples. The pitting potential increase ranged from 0.1 to 0.3 V. The pitting potential increase of the high dose samples was limited by pit formation at pre-existing scratches whereas the ma jority of the surface was free of pits to potentials up to 5 V(SCE).