BETA-PHASE FORMATION AND DISSOLUTION UNDER ION IRRADIATION IN CU PD THIN-FILMS/

Authors
QUAN Z NAUNDORF V MACHT MP WOLLENBERGER H
Citation
Z. Quan et al., BETA-PHASE FORMATION AND DISSOLUTION UNDER ION IRRADIATION IN CU PD THIN-FILMS/, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 80-1, 1993, pp. 408-411
Citations number
15
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
Journal title
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms → ACNP
ISSN journal
0168583X
Volume
80-1
Year of publication
1993
Part
1
Pages
408 - 411
Database
ISI
SICI code
0168-583X(1993)80-1:<408:BFADUI>2.0.ZU;2-O
Abstract
Phase formation and stability under 300 keV Cu+ irradiation have been investigated in Cu/Pd thin films using RBS. The beta phase formation w as identified by concentration steps in the diffusion profile. These s teps disappear after irradiation below 423 K at a rate of 1.5 x 10(-4) dpa/s indicating the dissolution of the beta phase. Irradiation above 503 K at a rate of 1.5 x 10(-2) dpa/s induces growth of the beta phas e layer. The stability of beta phase under irradiation is interpreted as a competition between cascade mixing and enhanced diffusion.