MICROSTRUCTURE IN THIN CARBON-FILMS

Authors
GONZALEZHERNANDEZ J VAZQUEZLOPEZ C ZUNIGASEGUNDO A CHAO BS
Citation
J. Gonzalezhernandez et al., MICROSTRUCTURE IN THIN CARBON-FILMS, Solid state communications, 87(1), 1993, pp. 23-26
Citations number
11
Categorie Soggetti
Physics, Condensed Matter
Journal title
Solid state communications → ACNP
ISSN journal
00381098
Volume
87
Issue
1
Year of publication
1993
Pages
23 - 26
Database
ISI
SICI code
0038-1098(1993)87:1<23:MITC>2.0.ZU;2-A
Abstract
Atomic force microscopy has been used to study the surface irregularit ies of hydrogenated and unhydrogenated carbon films grown by rf-powere d glow discharge and dc-magnetron sputtering, respectively. It is foun d that films produced with the latter technique have rougher surfaces. - Roughness can be reduced by increasing the rf-power density in glow discharge films and by decreasing the substrate temperature in sputter ed films.