SELECTIVE-AREA EPITAXY FOR GAAS-ON-INP OPTOELECTRONIC INTEGRATED-CIRCUITS (OEICS)

Citation
Pj. Osullivan et al., SELECTIVE-AREA EPITAXY FOR GAAS-ON-INP OPTOELECTRONIC INTEGRATED-CIRCUITS (OEICS), Semiconductor science and technology, 8(6), 1993, pp. 1179-1185
Citations number
7
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Condensed Matter","Material Science
ISSN journal
02681242
Volume
8
Issue
6
Year of publication
1993
Pages
1179 - 1185
Database
ISI
SICI code
0268-1242(1993)8:6<1179:SEFGOI>2.0.ZU;2-6
Abstract
Long-wavelength optoelectronic integrated circuits (OEICS) will be imp ortant components for future telecommunications systems, for example a s low-cost optical receivers or as nodes on high-speed optical network s. This paper reports the application of selective-area epitaxy (SAE) to the fabrication of monolithic GaAs-on-InP, long-wavelength OEICS in corporating optical detectors and transmitters together with digital a nd analogue electronics. We believe that this approach has produced th e highest functionality long-wavelength OEICS fabricated to date.