DENSITY OF ELECTRON-STATES OF INTRINSIC HYDROGENATED AMORPHOUS-SILICON

Citation
Oa. Golikova et al., DENSITY OF ELECTRON-STATES OF INTRINSIC HYDROGENATED AMORPHOUS-SILICON, Semiconductors, 27(3), 1993, pp. 260-262
Citations number
6
Categorie Soggetti
Physics, Condensed Matter
Journal title
ISSN journal
10637826
Volume
27
Issue
3
Year of publication
1993
Pages
260 - 262
Database
ISI
SICI code
1063-7826(1993)27:3<260:DOEOIH>2.0.ZU;2-J
Abstract
The results of experimental studies of the density of states g(epsilon ) Of ''intrinsic'' a-Si:H by the method of a space-charge-limited phot oinduced current flowing in structures with a Schottky barrier are pre sented. In the upper half of the mobility gap E(g) [from epsilon(c) to (epsilon(c)-E(g)/2)] the density g(epsilon) obtained by this method a grees with the density g(epsilon) plotted as g(epsilon(F)) for a serie s of psuedodoped samples (with a varying position of the Fermi level e psilon(F)). Psuedodoping was found to be linked with an increase in g( epsilon) in the lower half of the mobility gap [between epsilon(v) and (epsilon(v)+E(g)/2)].