THE INFLUENCE OF OXYGEN PARTIAL-PRESSURE ON THE PROPERTIES OF DC REACTIVE MAGNETRON-SPUTTERED TITANIUM-OXIDE FILMS

Authors
MENG LJ DOSSANTOS MP
Citation
Lj. Meng et Mp. Dossantos, THE INFLUENCE OF OXYGEN PARTIAL-PRESSURE ON THE PROPERTIES OF DC REACTIVE MAGNETRON-SPUTTERED TITANIUM-OXIDE FILMS, Applied surface science, 68(3), 1993, pp. 319-325
Citations number
17
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
68
Issue
3
Year of publication
1993
Pages
319 - 325
Database
ISI
SICI code
0169-4332(1993)68:3<319:TIOOPO>2.0.ZU;2-7
Abstract
Titanium oxide thin films were grown on glass substrates by DC reactiv e magnetron sputtering at various oxygen partial pressures. The films were characterized using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) and optical tra nsmittance spectra. The effects of the oxygen partial pressure on the structural and optical properties of titanium oxide films were investi gated.