UV AND OZONE CLEANING OF GASB (100) SURFACES PRIOR TO MBE GROWTH

Citation
N. Bertru et al., UV AND OZONE CLEANING OF GASB (100) SURFACES PRIOR TO MBE GROWTH, Applied surface science, 68(3), 1993, pp. 357-359
Citations number
7
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical
Journal title
ISSN journal
01694332
Volume
68
Issue
3
Year of publication
1993
Pages
357 - 359
Database
ISI
SICI code
0169-4332(1993)68:3<357:UAOCOG>2.0.ZU;2-7
Abstract
The formation of sacrificial oxides by UV-ozone exposure on GaAs and I nP is a well established procedure in the preparation of clean substra tes for MBE growth. We describe a UV-ozone treatment used to prepare G aSb(100) substrates and report results obtained by Auger (Auger electr on spectroscopy) which show that the quality of the so prepared substr ates is excellent for MBE (molecular beam epitaxy).