RELIABILITY IMPOSED DESIGN ASPECTS OF SUBMICROMETER POLYSILICON-EMITTER BIPOLAR-TRANSISTORS

Citation
Jn. Burghartz et Yj. Mii, RELIABILITY IMPOSED DESIGN ASPECTS OF SUBMICROMETER POLYSILICON-EMITTER BIPOLAR-TRANSISTORS, IEEE electron device letters, 14(7), 1993, pp. 363-365
Citations number
7
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
07413106
Volume
14
Issue
7
Year of publication
1993
Pages
363 - 365
Database
ISI
SICI code
0741-3106(1993)14:7<363:RIDAOS>2.0.ZU;2-1
Abstract
The device reliability of narrow poly-emitter bipolar transistors with very shallow emitter junctions is studied experimentally. The excess base current due to nonuniform poly doping, which is typically seen in such devices, is found not to accelerate device degradation. The lowe r doping at the emitter edge due to known perimeter depletion and emit ter plug effects (PPE's) leads to a reduced increase in base current p er perimeter length with stress. The results show that bipolar device scaling can likely be pursued to a point where PPE's start to appear, and that lateral emitter grading is effective in improving the device reliability.