ONE-STEP IN-DIFFUSION AS A RESULT OF MULTIPULSE LASER IRRADIATION OF LINBO3 SINGLE-CRYSTALLINE SUBSTRATES COVERED WITH THIN TI DEPOSITS - ON THE EFFECT OF THE RADIATION WAVELENGTH
A. Ferrari et al., ONE-STEP IN-DIFFUSION AS A RESULT OF MULTIPULSE LASER IRRADIATION OF LINBO3 SINGLE-CRYSTALLINE SUBSTRATES COVERED WITH THIN TI DEPOSITS - ON THE EFFECT OF THE RADIATION WAVELENGTH, J. mod. opt., 40(6), 1993, pp. 1043-1052
We studied Ti in-diffusion as an effect of multipulse laser irradiatio
n, in either visible of ultraviolet (u.v.) spectral ranges, of LiNbO3
single-crystalline structures with Ti coatings of two different thickn
esses. It is shown that while u.v. (excimer, lambda almost-equal-to 30
8 nm) laser irradiation causes a complete expulsion of the Ti deposit,
the visible (ruby, lambda almost-equal-to 694.3 nm) laser irradiation
at intermediate incident laser fluence (up to almost-equal-to 0.7 J c
m-2) promotes efficient Ti in-diffusion from the thin (400 angstrom wi
dth) Ti deposit down to a micrometre range implantation depth.