MECHANISM OF THE CONFIGURATIONAL CHANGE OF METASTABLE DEFECTS IN SILICON

Citation
Wm. Chen et al., MECHANISM OF THE CONFIGURATIONAL CHANGE OF METASTABLE DEFECTS IN SILICON, Physical review letters, 71(3), 1993, pp. 416-419
Citations number
22
Categorie Soggetti
Physics
Journal title
ISSN journal
00319007
Volume
71
Issue
3
Year of publication
1993
Pages
416 - 419
Database
ISI
SICI code
0031-9007(1993)71:3<416:MOTCCO>2.0.ZU;2-V
Abstract
From a detailed study of two different defects in silicon, excitonic A uger capture is shown to be an important mechanism of the configuratio nal change of metastable defects. A free exciton interacts with the de fect and recombines, transferring its energy to an electron, which wil l be emitted high up into the conduction band. This hot Auger electron will quickly reach the bottom of the conduction band. The liberated e nergy may excite the defect above the barrier between the two configur ations.