Mj. Martin et al., SIMULATION OF ELECTRON-TRANSPORT IN SILICON - IMPACT-IONIZATION PROCESSES, Semiconductor science and technology, 8(7), 1993, pp. 1291-1297
Using non-parabolic ellipsoidal X and L valleys to represent the condu
ction band of Si, we have developed a Monte Carlo simulation for the s
tudy of electron transport properties in this material, under both low
and high electric field conditions. Employing a simple model for the
characterization of the impact ionization processes we have obtained t
he ionization coefficient and the probability of electron ionization.
The results highlight the importance of the L valleys in very high tra
nsport phenomena, and compare favourably with other experimental and t
heoretical data.