SOME ASPECTS OF THE FORMATION AND DISSOLUTION BEHAVIOR OF HAFNIUM OXIDE IN NAOH SOLUTIONS

Authors
HEFNY MM SALIH SA ABDELKHALEK AA ELMAHDY GA
Citation
Mm. Hefny et al., SOME ASPECTS OF THE FORMATION AND DISSOLUTION BEHAVIOR OF HAFNIUM OXIDE IN NAOH SOLUTIONS, Thin solid films, 230(1), 1993, pp. 10-14
Citations number
25
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
Thin solid films → ACNP
ISSN journal
00406090
Volume
230
Issue
1
Year of publication
1993
Pages
10 - 14
Database
ISI
SICI code
0040-6090(1993)230:1<10:SAOTFA>2.0.ZU;2-X
Abstract
This investigation was conducted to study the influence of NaOH concen tration, formation voltage an temperature on the dissolution and imped ance behaviour of anodic oxide films on hafnium. The stability of the oxide decreases with increasing NaOH concentration, film thickness and temperature. The dissolution rate coefficient, activation energy and the angle theta were calculated. The impedance behaviour of the anodiz ed hafnium surface was found to be purely capacitive under various con ditions.