The establishment, characterization, and debugging of resist processes
for advanced lithography systems have changed significantly with the
advent of statistical quality control procedures and the use of design
ed experiments. This paper describes the metrology and experimental de
sign procedures used for producing track system resist coating uniform
ities with standard deviations of less than 0.5 nm. The key to the app
roach lies in the use of Hadamard orthogonal designs [1].