Authors
Citation
R. Mohondro et P. Gaboury, CHARACTERIZING COAT, BAKE, AND DEVELOP PROCESSES, Solid state technology, 36(7), 1993, pp. 87
Citations number
2
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied","Physics, Condensed Matter
Journal title
ISSN journal
0038111X
Volume
36
Issue
7
Year of publication
1993
Database
ISI
SICI code
0038-111X(1993)36:7<87:CCBADP>2.0.ZU;2-K
Abstract
The establishment, characterization, and debugging of resist processes
for advanced lithography systems have changed significantly with the
advent of statistical quality control procedures and the use of design
ed experiments. This paper describes the metrology and experimental de
sign procedures used for producing track system resist coating uniform
ities with standard deviations of less than 0.5 nm. The key to the app
roach lies in the use of Hadamard orthogonal designs [1].