O. Fukumasa et al., CONTROL OF REACTIVE PLASMAS IN A MULTICUSP PLASMA SOURCE EQUIPPED WITH A MOVABLE MAGNETIC FILTER, Journal of applied physics, 74(2), 1993, pp. 848-852
With the use of both a movable magnetic filter and a plasma grid, plas
ma parameters (H-2-CH4 or Ar-CH4 plasmas) are spatially well controlle
d. At any filter position, plasma parameters change steeply across the
magnetic filter. Then, a plasma source is divided into the two parts,
i.e., the source plasma region (high density plasma with energetic el
ectrons) and the diffused plasma region (low density and low-temperatu
re plasma without energetic electrons). Plasma parameters in the diffu
sed plasma are well controlled by changing the plasma grid potential.
The role of the magnetic filter (i.e., preferential reflection of ener
getic electrons) is well clarified by computer simulation. The relatio
n between plasma parameters and some species of neutral radicals is al
so briefly discussed.