ELECTRON-DISTRIBUTION IN PSEUDOMORPHIC AL0.30GA0.70AS IN0.15GA0.85AS/GAAS DELTA-DOPED HETEROSTRUCTURES/

Citation
Jm. Fernandez et al., ELECTRON-DISTRIBUTION IN PSEUDOMORPHIC AL0.30GA0.70AS IN0.15GA0.85AS/GAAS DELTA-DOPED HETEROSTRUCTURES/, Journal of applied physics, 74(2), 1993, pp. 1161-1168
Citations number
17
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
74
Issue
2
Year of publication
1993
Pages
1161 - 1168
Database
ISI
SICI code
0021-8979(1993)74:2<1161:EIPAI>2.0.ZU;2-6
Abstract
We have investigated the electronic properties of the delta-modulation -doped Al0.30Ga0.70As/In0.15Ga0.85As heterojunction for a variety of d ifferent configurations. Experimental findings are compared with theor etical predictions based on the two-band effective mass approximation including strain, many-body, finite temperature, and DX center effects . We have also examined the case where the delta doping is placed in a n embedded GaAs well within the Al0.30Ga0.70As. This is intended to re duce the effects of DX centers. In this instance, as the doping concen tration is increased, experimentally determined channel density, n(s), suggests higher saturation values, which may leave a residual electro n density in the GaAs well. This residual charge density is parallel w ith the electron density in the InGaAs well and represents an addition al conducting path. The features of the theoretical channel density ve rsus doping density curves are confirmed by 300 and 1.6 K resistivity and Hall measurements, and Shubnikov-de Haas measurements made at 1.6 K.