GROWTH OF THIN DENSE GAS-TIGHT (TB,Y)-ZRO2 FILMS BY ELECTROCHEMICAL VAPOR-DEPOSITION

Authors
CAO GZ MEIJERINK J BRINKMAN HW DEVRIES KJ BURGGRAAF AJ
Citation
Gz. Cao et al., GROWTH OF THIN DENSE GAS-TIGHT (TB,Y)-ZRO2 FILMS BY ELECTROCHEMICAL VAPOR-DEPOSITION, Journal of materials chemistry, 3(7), 1993, pp. 773-774
Citations number
15
Categorie Soggetti
Chemistry Physical","Material Science
Journal title
Journal of materials chemistry → ACNP
ISSN journal
09599428
Volume
3
Issue
7
Year of publication
1993
Pages
773 - 774
Database
ISI
SICI code
0959-9428(1993)3:7<773:GOTDG(>2.0.ZU;2-V
Abstract
Electrochemical vapour deposition has been applied to depositing thin, dense, gas-tight terbia- and yttria-stabilized zirconia films on poro us ceramics using metal chlorides as precursors. (Tb,Y)-ZrO2 solid sol utions have a fluorite-type structure and have a high mixed conductivi ty and oxygen semipermeability.