FAST AND ACCURATE ASSESSMENT OF NANOMETER LAYERS USING GRAZING X-RAY REFLECTOMETRY

Authors
SCHILLER C MARTIN GM VANDERHOOGENHOF WW CORNO J
Citation
C. Schiller et al., FAST AND ACCURATE ASSESSMENT OF NANOMETER LAYERS USING GRAZING X-RAY REFLECTOMETRY, Philips journal of research, 47(3-5), 1993, pp. 217-234
Citations number
10
Categorie Soggetti
Engineering
Journal title
Philips journal of research → ACNP
ISSN journal
01655817
Volume
47
Issue
3-5
Year of publication
1993
Pages
217 - 234
Database
ISI
SICI code
0165-5817(1993)47:3-5<217:FAAAON>2.0.ZU;2-7
Abstract
Grazing X-ray reflectivity is used to assess thin and ultra thin layer s in the nanometre range. Different experimental setups have been test ed. We tried to optimize the measurements and to develop a method with the most convenient performance in resolution and measuring time. Exa mples will be given of III-V compounds layers, metallic films and thin films used in semiconductor technologies. The limitations and the pre cision of the several techniques will be discussed.