Analytical methods such as X-ray diffraction, X-ray fluorescence, indu
ctively coupled plasma emission spectroscopy, scanning electron micros
copy and transmission electron microscopy are essential for the invest
igation of the growth of thin films. The chemical and structural data
obtained for titanate thin films are the basis for the discussion of t
he electrical properties of thin films and the development of processe
s for the fabrication of films for microelectronic applications.