ORIENTATION AND CHEMISTRY OF ALKYL THIOLATES ON THE NI(100) SURFACE

Citation
B. Parker et Aj. Gellman, ORIENTATION AND CHEMISTRY OF ALKYL THIOLATES ON THE NI(100) SURFACE, Surface science, 292(3), 1993, pp. 223-234
Citations number
28
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
292
Issue
3
Year of publication
1993
Pages
223 - 234
Database
ISI
SICI code
0039-6028(1993)292:3<223:OACOAT>2.0.ZU;2-S
Abstract
As models for boundary layer films we have examined the structure and chemistry of the straight-chain thiols (CH3(CH2)(n)SH, n = 0-5) on the clean Ni(100) surface. On the clean surface the thiols decompose at l ow temperatures (T < 140 K) to form adsorbed alkylthiolates (CH3(CH2)( n)S-(ad)). Further decomposition at higher temperatures results in the formation and desorption of alkanes, olefins and hydrogen, and leaves sulfur adsorbed to the surface. Since no sulfur containing species de sorb it is possible to determine the alkylthiolate coverage by measuri ng the sulfur coverage on the surface following decomposition. These m easurements have been made for saturated monolayers of methylthiolate through hexylthiolate. The saturation coverage remains constant at the ta = 0.28 +/- 0.04 monolayers as the number of methylene groups in the alkyl chain increases. This suggests that the thiolates in these film s have self-assembled into a structure in which the alkyl chains are o riented away from the surface.