The reaction of silane with atomic oxygen (P-3) was investigated by th
e shock-tube-laser-photolysis method over the temperature range of 900
-1170 K. Oxygen atoms were produced by the ArF laser photolysis of SO2
behind reflected shock waves and monitored with atomic resonance abso
rption spectroscopy. The rate constant for the SiH4 + O reaction was e
valuated by taking the possible contribution of the consecutive reacti
on into consideration. The Arrhenius temperature coefficient was deter
mined to be E(a) = 26.6 kJ mol(-1), which is much higher than the expe
rimental activation energies obtained at lower temperatures. Rate cons
tants calculated by a transition state theory with the reaction barrie
r height of E(0) = 10.2 kJ mol(-1) agreed well with both the present a
nd the previous experimental results for a wide temperature range.