REACTION OF SILANE WITH ATOMIC OXYGEN AT HIGH-TEMPERATURES

The reaction of silane with atomic oxygen (P-3) was investigated by th e shock-tube-laser-photolysis method over the temperature range of 900 -1170 K. Oxygen atoms were produced by the ArF laser photolysis of SO2 behind reflected shock waves and monitored with atomic resonance abso rption spectroscopy. The rate constant for the SiH4 + O reaction was e valuated by taking the possible contribution of the consecutive reacti on into consideration. The Arrhenius temperature coefficient was deter mined to be E(a) = 26.6 kJ mol(-1), which is much higher than the expe rimental activation energies obtained at lower temperatures. Rate cons tants calculated by a transition state theory with the reaction barrie r height of E(0) = 10.2 kJ mol(-1) agreed well with both the present a nd the previous experimental results for a wide temperature range.