MICROSTRUCTURE OF IRON NITRIDE TITANIUM NITRIDE FILMS PREPARED BY CVD

The microstructure of iron nitride-titanium nitride binary films prepa red by CVD was investigated by electron microscopy in comparison with those of iron nitride and titanium nitride films. Their microstructure s varied from that similar to that of iron nitride film to that of tit anium nitride film depending on Ti/(Fe + Ti). These films were made up of columnar particles grown normal to the substrate in the upper regi on near the surface and finer particles in the lower region near the s ubstrate. Two different composition regions with 0.6 mum in size exist ed in this lower region near the substrate. Two regions with different composition existed at the initial stage of the deposition.